Descaling and purifying facial mask for weekly use for acne-prone and seborrheic skin. The incorporation of inert granules to the exclusive m.acne complex ™provides mechanical exfoliating action and cell renewal for optimal control of oily or acne-prone skin.
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Acne vulgaris is caused by an androgenic excess that promotes an increase in both keratinization and follicular desquamation, as well as sebum secretion. Which in turn will cause the obstruction of the skin pore and its subsequent inflammation by opportunistic action of the bacterial flora present in the skin, giving rise to the typical acne lesions in the form of comedones, papules, pustules and residual hyperpigmentation.
Chemoexfoliating retinoid that enhances cell renewal of the pilosebaceous unit.
Exfoliating and absorbing action of excess sebum, which improves the smoothness of the skin.
Apply a layer of pure renewing mask once a week on clean skin, avoiding contact with the eye area and mucous membranes, and leave it to act for between 5 and 10 minutes. Then perform a gentle friction massage so that the microparticles drag the impurities from the stratum corneum. Remove with plenty of water. The subsequent application of dermatological sun protection SPF50+ is recommended in case of exposure to solar radiation. Do not apply pure renewing mask during the treatment period with the acne-peel system method
